Influence of the electrical parameters on the input impedance of a fractal structure realised on silicon

By T. Haba, G. Ablart, T. Camps, F. Olivié. 2005

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Fabrication of a Fractional Order Capacitor With Desired Specifications: A Study on Process Identification and Characterization (2011, background): “only if there is formation of porous structure on a metallic surface [9].”
Approximated Fractional Order Chebyshev Lowpass Filters (2015, background): “While these devices are not yet commercially available, recent research regarding their manufacture and production shows very promising results [19–21].”
Analog Fractional Order Controller in Temperature and Motor Control Applications (2008, background): “Haba et al. (2005) demonstrated that it is possible to create fractional order impedances in the 100 kHz to 10 GHz range by fabrication of a fractal structure on silicon.”