Gas diffusion ultrabarriers on polymer substrates using Al2O3 atomic layer deposition and SiN plasma-enhanced chemical vapor deposition

By P. Carcia, R. S. Mclean, M. Groner, A. Dameron, S. George. 2009

231 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials

View Paper: https://www.semanticscholar.org/paper/65e24df99e2077e5daaf141b43d4a362cc7876e9

Citations in the corpus

• Advances in barrier coatings and film technologies for achieving sustainable packaging of food products – A review (2021, unknown): “…surface coverage with fewer defects, and has been used to deposit Al2O3, SiO2, SiNx, and TiO2 coatings to improve the gas barrier property of the PP films (Andringa et al., 2015; Carcia et al., 2009; Gebhard et al., 2016, 2018; Hoffmann et al., 2015; Meshkova et al., 2018; Ozkaya et al., 2015).”