Surface passivation of p-type crystalline Si by plasma enhanced chemical vapor deposited amorphous SiC x :H films

By I. Martín, M. Vetter, A. Orpella, J. Puigdollers, A. Cuevas, R. Alcubilla. 2001

149 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/638b7e2e2d4a7dca414401acd90eced71539a3cd

Citations in the corpus

• High-Efficiency c-Si Solar Cells Passivated With ALD and PECVD Aluminum Oxide (2010, unknown): “, SiO2 [5], a-Si [6], a-SiNx [7], and a-SiCx [8]).”