Area-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu, Co, W, and Ru

By Dara Bobb-Semple, Katie L. Nardi, Nerissa Draeger, D. Hausmann, S. Bent. Chemistry of Materials, 2019

155 citations recorded by the source corpus.

Area-selective atomic layer deposition (AS-ALD) is a promising “bottom-up” alternative to current nanopatterning techniques. Self-assembled monolayers (SAM) have been successfully employed as deact...

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/635f7d3a07e77ce76526413880de5143be08e4c9