Fundamentals of silicon material properties for successful exploitation of strain engineering in modern CMOS manufacturing
By P. Chidambaram, C. Bowen, S. Chakravarthi, C. Machala, R. Wise. IEEE Transactions on Electron Devices, 2006
176 citations recorded by the source corpus.
Subfields: Biomedical Engineering, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/612320346177bfb21f259c3d84ccb6af1e9bfde4
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In Electrical and Electronic Engineering
Citations in the corpus
- Carrier-Transport-Enhanced Channel CMOS for Improved Power Consumption and Performance (2008, background): “In contrast, so-called local strain technologies [72], like”