Effect of postdeposition annealing on the thermal stability and structural characteristics of sputtered HfO2 films on Si(100)

By G. He, Meng Liu, L. Zhu, M. Chang, Q. Fang, L. Zhang. 2005

212 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/608b4bcb1ddc4c065479072b6b32fe7a51a6b08f