Impact of gate workfunction on device performance at the 50 nm technology node

By I. De, D. Johri, A. Srivastava, C. Osburn. 2000

180 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/5c52127ecfaae8231f7a17b882ee1f2cb50f29a1