Comparative study of ITO layers deposited by DC and RF magnetron sputtering at room temperature
By F. Kurdesau, G. Khripunov, A. D. Cunha, M. Kaelin, A. Tiwari. 2006
184 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/5acc36d43a32cd265ca998744d45a5c68a1a883e
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In Electrical and Electronic Engineering
Citations in the corpus
- Indium-Tin-Oxide for High-performance Electro-optic Modulation (2015, background): “) was observed, as well as a difference in the crystalline structure andmorphology of the formed layers [53].”