Spectroscopic Ellipsometry: Principles and Applications

By Hiroyuki Fujiwara, Download Here. 2007

1,449 citations recorded by the source corpus.

Subfields: Biomedical Engineering

View Paper: https://www.semanticscholar.org/paper/5a603c09cbcbae6c295c46996eef4baa4367c16d

Citations in the corpus

• An insight into optical metrology in manufacturing (2020, neutral): “Ellipsometry is an optical measurement technique that characterizes thin films (by, for example, film thickness and optical constants) based on the change in polarized light before and after the light is reflected (or transmitted) by a sample [244, 245].”
• Ellipsometry at the nanoscale (2013, neutral): “for Semiconductor Device Applications . . . . . . . . . . . . . . . . . . . . 557 Alain C. Diebold, Florence J. Nelson and Vimal K. Kamineni 17 Ellipsometry of Semiconductor Nanocrystals . . . . . . . . . . . . . . . .”
• Optical and Structural Properties of Ultra‐thin Gold Films (2014, neutral): “[2] Furthermore, even in the case of structurally perfect films, the (local) dielectric function is a classical concept”