Thickness dependent electrical resistivity of ultrathin (<40 nm) Cu films

By H.D. Liu, Yiping Zhao, G. Ramanath, S. Murarka, Gwo-Ching Wang. 2001

222 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials

View Paper: https://www.semanticscholar.org/paper/5a28f6f4f33e8de2169b625bff126799356f1c8c