Role of fluorocarbon film formation in the etching of silicon, silicon dioxide, silicon nitride, and amorphous hydrogenated silicon carbide

By T. Standaert, C. Hedlund, E. Joseph, G. Oehrlein, T. Dalton. 2004

268 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/59fac9809fdc8d56e95099258b4ece0cc0ae7265