Development of a deep silicon phase Fresnel lens using Gray-scale lithography and deep reactive ion etching

By Brian Morgan, C. Waits, J. Krizmanic, Reza Ghodssi. Journal of microelectromechanical systems, 2004

147 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Radiation

View Paper: https://www.semanticscholar.org/paper/594f60fdc0e99c136f527c152ff22cf625879abb

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In Electrical and Electronic Engineering

1. Steven Diamond
2. Stephen P. Boyd
3. Mung Chiang
4. D. P. Palomar

In Radiation

1. Gordon Wetzstein
2. Yifan Peng

Citations in the corpus

• End-to-end optimization of optics and image processing for achromatic extended depth of field and super-resolution imaging (2018, methodology): “16-phase-level structures) of photolithography and reactive iron etching techniques [Morgan et al. 2004] to fabricate optics that are optimized with Fourier coefficient parameterizations of the discretized height map.”