Three-dimensional direct laser writing inspired by stimulated-emission-depletion microscopy [Invited]
By J. Fischer, M. Wegener. 2011
222 citations recorded by the source corpus.
Three-dimensional direct laser writing has become a well established, versatile, widespread, and even readily commercially available “workhorse” of nano- and micro-technology. However, its lateral and axial spatial resolution is inherently governed by Abbe’s diffraction limitation – analogous to optical microscopy. In microscopy, stimulated-emission-depletion approaches have lately circumvented Abbe’s barrier and lateral resolutions down to 5.6 nm using visible light have been achieved. In this paper, after very briefly reviewing our previous efforts with respect to translating this success in optical microscopy to optical lithography, we present our latest results regarding resolution improvement in the lateral as well as in the much more relevant axial direction. The structures presented in this paper set a new resolution-benchmark for next-generation direct-laser-writing optical lithography. In particular, we break the lateral and the axial Abbe criterion for the first time.
Subfields: Biomedical Engineering, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/57134cc850e52d1fe494609a4452a90a7933144e
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Citations in the corpus
- Three-dimensional femtosecond laser processing for lab-on-a-chip applications (2018, methodology): “The size of the smallest detail on a 3D structure that can be made with TPP structure (feature size) is typically around 150–200 nm, but with various deactivation methods feature size of <50 nm was demonstrated even in the axial direction [61, 123, 124].”