PECVD of amorphous TiO2 thin films: effect of growth temperature and plasma gas composition

By G. Battiston, R. Gerbasi, A. Gregori, M. Porchia, S. Cattarin, G. Rizzi. 2000

146 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/5579e42770c95a7f80fd9a9388851ca0912068be