Deep dry etching of borosilicate glass using SF6 and SF6/Ar inductively coupled plasmas

By J. Park, Nae-Eung Lee, Jaechan Lee, Joon-Shik Park, H. D. Park. 2005

156 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/52a3adacd24ec5c21628df16edac32d681f9919e