Sensitivity of double-gate and FinFETDevices to process variations
By Shiying Xiong, Jeffrey Bokor. 2003
231 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/51a5993d4dfeb405a8b0843fdc2827759e5ed6df
How researchers see this paper
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In Electrical and Electronic Engineering
- Isabelle Ferain
- Ran Yan
- Jean-Pierre Colinge
- Suresh Gundapaneni
- Anil Kottantharayil
- S. Ganguly
- Te-Kuang Chiang
- David J. Larson
Citations in the corpus
- Junctionless Transistors: Physics and Properties (2011, background): “Another problem associated with the statistical distribution of doping impurities is the variation of effective channel length, Leff, defined as the distance between the source junction and the drain junction [8].”