Recent developments in EUV reflectometry at the Advanced Light Source

By E. Gullikson, S. Mrowka, B. Kaufmann. SPIE Advanced Lithography, 2001

134 citations recorded by the source corpus.

Subfields: Computational Mechanics, Electrical and Electronic Engineering, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/5181942cffb80e3a0a66cabaa4b852ce8558a0a8

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Citations in the corpus

• The Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory (SDO) (2011, methodology): “LLNL led the reflectance calibration and mapping of all AIA EUV flight mirrors, using the reflectometer at beam line 6.3.2 of the Advanced Light Source synchrotron at Lawrence Berkeley National Laboratory (Underwood et al., 1997; Gullikson, Mrowka, and Kaufmann, 2001).”