Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition
By F. Massines, C. Sarra-Bournet, F. Fanelli, N. Naudé, N. Gherardi. 2012
332 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering, Radiology, Nuclear Medicine and Imaging, Surfaces, Coatings and Films
View Paper: https://www.semanticscholar.org/paper/50d2036c9fe61d43d3b3402c0496a68d5aff57c6
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In Electrical and Electronic Engineering
In Radiology, Nuclear Medicine and Imaging
In Surfaces, Coatings and Films
Citations in the corpus
- Atmospheric pressure non-equilibrium plasma jet technology: general features, specificities and applications in surface processing of materials (2017, methodology): “The discharge physics is primarily dictated by the main gas, however the presence of additives can significantly affect the discharge regime [11].”