Atomic Layer Deposition for Membranes: Basics, Challenges, and Opportunities

By M. Weber, A. Julbe, A. Ayral, P. Miele, Mikhael Bechelany. Chemistry of Materials, 2018

161 citations recorded by the source corpus.

Atomic layer deposition (ALD) is a technology offering the possibility to prepare thin films of high quality materials on high aspect ratio substrates with precise thickness control, high uniformit...

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/4f206f738669f620ac8d3bade3ee2e008db0fa80