ZnO diode fabricated by excimer-laser doping

By T. Aoki, Y. Hatanaka, D. Look. 2000

703 citations recorded by the source corpus.

A ZnO diode was fabricated by using a laser-doping technique to form a p-type ZnO layer on an n-type ZnO substrate. A zinc-phosphide compound, used as a phosphorous source, was deposited on the ZnO wafer and subjected to excimer-laser pulses. The current–voltage characteristics showed a diode characteristic between the phosphorous-doped p-layer and the n-type substrate. Moreover, light emission, with a band-edge component, was observed by forward current injection at 110 K.

Subfields: Condensed Matter Physics, Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/4d77f1069adfdc3dd5a5cb718bf50985d7e45d0c

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In Condensed Matter Physics

  1. Jang-Won Kang
  2. Seong-Ju Park
  3. D. Hwang
  4. Yong‐Seok Choi

In Electrical and Electronic Engineering

  1. Seong-Ju Park
  2. Jang-Won Kang
  3. Agnieszka Kołodziejczak-Radzimska
  4. T. Jesionowski
  5. D. Hwang
  6. Yong‐Seok Choi

In Materials Chemistry

  1. Agnieszka Kołodziejczak-Radzimska
  2. T. Jesionowski
  3. Seong-Ju Park
  4. D. Hwang
  5. Jang-Won Kang
  6. Yong‐Seok Choi

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