Fabrication of photonic crystals for the visible spectrum by holographic lithography
By M. Campbell, D. N. Sharp, M. T. Harrison, R. Denning, A. Turberfield. Nature, 2000
1,646 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Surfaces, Coatings and Films
View Paper: https://www.semanticscholar.org/paper/4743b6c838322e6b4756f28167c6cf982bd0fa50
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In Atomic and Molecular Physics, and Optics
- M. Wegener
- Costas M. Soukoulis
- Zhong Lin Wang
- Kurt Busch
- Edward H. Sargent
- Masaya Notomi
- E. Istrate
- F. Barthelat
In Electrical and Electronic Engineering
- Zhong Lin Wang
- M. Wegener
- Costas M. Soukoulis
- Sheng Xu
- Kurt Busch
- Edward H. Sargent
- Masaya Notomi
- E. Istrate
In Surfaces, Coatings and Films
Citations in the corpus
- Direct laser writing of three-dimensional photonic-crystal templates for telecommunications (2004, background): “Holographic lithography is capable of providing defect-free films with thicknesses of several tens of unit cells and lateral extents of several square millimetres, and offers a tremendous flexibility in tailoring the interior of the unit cel”
- Photonic crystal heterostructures and interfaces (2006, methodology): “By using semiconductors with different band gaps and electron affinities, considerable freedom is obtained in selecting the band arrangements of resulting structures, leading to the concept of band-gap engineering Capasso, 1992 .”