HfO2/SiO2 interface chemistry studied by synchrotron radiation x-ray photoelectron spectroscopy

By O. Renault, D. Samour, J. Damlencourt, D. Blin, F. Martin, S. Marthon, N. Barrett, P. Besson. 2002

196 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/4379e027d557a82d7debc99cf574db3993bf22e9