Towards implementation of a nickel silicide process for CMOS technologies

By C. Lavoie, F. d'Heurle, C. Detavernier, C. Cabral. 2003

397 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/409d1c06d37f3d981f67bfc6cd41fcb871f8cd44