Comparison of the effects of Ar and H2 plasmas on the performance of homojunctioned amorphous indium gallium zinc oxide thin film transistors

By B. Ahn, H. Shin, Hyun Jae Kim, Jin-seong Park, Jae Kyeong Jeong. 2008

206 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/3e4ebd6e072fdc1910222017a656938ea129bd0e