Highly ordered graphene for two dimensional electronics
By J. Hass, R. Feng, Tianbo Li, X. Li, Z. Zong, W. D. Heer, P. First, E. Conrad, C. Jeffrey, C. Berger. 2006
321 citations recorded by the source corpus.
With expanding interest in graphene-based electronics, it is crucial that high quality graphene films be grown. Sublimation of Si from the 4H-SiC(0001) (Si-terminated) surface in ultrahigh vacuum is a demonstrated method to produce epitaxial graphene sheets on a semiconductor. In this letter the authors show that graphene grown from the SiC(0001¯) (C-terminated) surface are of higher quality than those previously grown on SiC(0001). Graphene grown on the C face can have structural domain sizes more than three times larger than those grown on the Si face while at the same time reducing SiC substrate disorder from sublimation by an order of magnitude.
Subfields: Biomedical Engineering, Electrical and Electronic Engineering, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/3dd8d13945333564582dfbeedc60111f44c01a58
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Citations in the corpus
- Production, properties and potential of graphene (2010, background): “[71] Hass J, Feng R, Li T, Li X, Zong Z, Heer WAd, et al.”
- Graphene based materials: Past, present and future (2011, background): “Another uncertainty involves the different epitaxial growth patterns on different SiC polar face (i.e. Si-face or C-face).”
- Modeling, Analysis, and Design of Graphene Nano-Ribbon Interconnects (2009, background): “It should be noted that there is a report that the adjacent layers do not interact with each other in multilayer GNRs grown on C-faced 4H-SiC (0001̄) [32], [49].”