Electron beam lithography writing strategies for low loss, high confinement silicon optical waveguides
By R. Bojko, Jing Li, Li He, T. Baehr‐Jones, Michael Hochberg, Yukinori Aida. 2011
147 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Surfaces, Coatings and Films
View Paper: https://www.semanticscholar.org/paper/3d1f2851bf18f1776b939214bfd38afb607ba634
How researchers see this paper
The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.
In Atomic and Molecular Physics, and Optics
- Alexander Gaeta
- Michal Lipson
- J. Cardenas
- A. Dutt
- David J. Moss
- Roberto Morandotti
- Arnan Mitchell
- Xingyuan Xu
In Electrical and Electronic Engineering
- Alexander Gaeta
- Michal Lipson
- J. Cardenas
- A. Dutt
- David J. Moss
- Roberto Morandotti
- Arnan Mitchell
- Xingyuan Xu
In Surfaces, Coatings and Films
Citations in the corpus
- Ultra-low-loss on-chip resonators with sub-milliwatt parametric oscillation threshold (2017, background): “The principle of multipass lithography [39,40] consists of exposing the same pattern multiple times at a lower current to reduce line edge roughness by averaging statistical errors.”