300-mm Monolithic Silicon Photonics Foundry Technology

By K. Giewont, K. Nummy, Frederick A. Anderson, J. Ayala, Tymon Barwicz, Yusheng Bian, K. Dezfulian, D. Gill, T. Houghton, Shuren Hu and 7 more. IEEE Journal of Selected Topics in Quantum Electronics, 2019

181 citations recorded by the source corpus.

A competitive 300-mm silicon photonics foundry technology has been developed by GLOBALFOUNDRIES for general availability, which takes advantage of advanced CMOS process technology and provides a manufacturing scale. A state-of-the-art process design kit offers a codesign environment with access to a comprehensive photonics device library along with a monolithically integrated SOI CMOS device library. Advances in automated wafer-level optical test enable statistical photonic device characterization for development, photonic modeling, and manufacturing controls. The key challenges and solutions in developing a manufacturable photonic technology with state-of-the-art performance are described, as well as a roadmap for next generation high-performance monolithic silicon photonics are outlined.

Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/3ad227643b9d6d90f27c513d666a8a77fc7b62b2

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In Atomic and Molecular Physics, and Optics

In Electrical and Electronic Engineering

Citations in the corpus

Roadmapping the next generation of silicon photonics (2023, background): “At the most extreme, the MPW (multi-project wafer) runs that the foundries host allow multiple users to share the costs of a single wafer run to develop products cost-efficiently.”