Improvement in Al2O3 dielectric behavior by using ozone as an oxidant for the atomic layer deposition technique

By Jaebum Kim, D. Kwon, K. Chakrabarti, Chongmu Lee, K. Oh, Jong-Joo Lee. 2002

151 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/39239c392fd68e9df39c63ad8c6e3e19f4b46451