Fabrication of <5 nm width lines in poly(methylmethacrylate) resist using a water:isopropyl alcohol developer and ultrasonically-assisted development

By S. Yasin, D. Hasko, H. Ahmed. 2001

161 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/37b4cd8020a513b264bc4ff5950bce9d72451d6d