5 nm Ruthenium Thin Film as a Directly Plateable Copper Diffusion Barrier

By T. Arunagiri, Yibin Zhang, O. Chyan, M. El-Bouanani, M. J. Kim, Kuei-Hsien Chen, Chiu-Hsien Wu, L. C. Chen. 2005

169 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials

View Paper: https://www.semanticscholar.org/paper/35345048af24b9f1e21c892301f7d104c42a12c8