Selective Deposition of Proteins and Cells in Arrays of Microwells
By E. Ostuni, Christopher S. Chen, Donald E. Ingber, George M. Whitesides. 2001
218 citations recorded by the source corpus.
Subfields: Biomedical Engineering
View Paper: https://www.semanticscholar.org/paper/30a01e48c6c1a240371a6bf25df6592c214bd26d
How researchers see this paper
The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.
In Biomedical Engineering
- George M. Whitesides
- Donald E. Ingber
- D. Di Carlo
- Shuichi Takayama
- Xingyu Jiang
- E. Ostuni
- Phenix-Lan Quan
- Martin Sauzade
Citations in the corpus
- Dynamic single cell culture array. (2006, methodology): “Other techniques that allow single cell arrays of adherent cells in most cases require protein patterning of the surface or chemical treatments [ 1 ].”
- A Microfluidic Chip for Cell Patterning Utilizing Paired Microwells and Protein Patterns † (2016, methodology): “reported a convenient method for cell patterning using microwells coated by fibronectin, a commonly used cell adhesive protein [38].”
- dPCR: A Technology Review (2018, background): “The oil phase preferentially wets the top of the array and creates a meniscus that displaces the aqueous phase; however, the oil/aqueous phase/solid triple line gets pinned at transitions between hydrophobic and hydrophilic areas [58,67].”
- 3D Self-Organized Microvascular Model of the Human Blood-Brain Barrier with Endothelial Cells, Pericytes and Astrocytes (2018, background): “Accordingly, distinct surface modifications that could reduce non-specific absorption include coating the PDMS surface with bovine serum albumin (BSA) [68], grafting with anti-fouling molecules [69], or silanization [70].”
- Soft lithography in biology and biochemistry. (2001, methodology): “We have developed a method for patterning the adhesion of cells in high-density arrays of microscopic wells (ca 10,000 wells/cm2, 50-μm well diameter) that are fabricated by replica molding of PDMS against a master of photoresist (223).”