Characterization of ALCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy

By H. Nohira, Wilman Tsai, W. Besling, E. Young, J. Pétry, T. Conard, W. Vandervorst, S. Gendt, M. Heyns, J. Maes and 1 more. 2002

185 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/2ecb5e27211bca09a6f6c3c8deda65efe5ff829f