Atomic layer deposition: an overview.

By S. George. Chemical Reviews, 2010

5,342 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/2b0b65e0ae0add7be5e2b5dd8dcc26dd74c79a5e

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Electrical and Electronic Engineering

1. Soojin Park
2. Yifan Zhang
3. Jianlong Ge
4. Young-Jung Heo
5. Dae Yang Oh
6. Hong Li
7. Yue Qi
8. Yousung Jung

In Materials Chemistry

1. K. Sivula
2. Young-Jung Heo
3. M. Graetzel
4. Jianlong Ge
5. Yifan Zhang
6. Soojin Park
7. Dae Yang Oh
8. Sungwook Hong

Citations in the corpus

• Towards atomic and close-to-atomic scale manufacturing (2019, background): “metals, insulators, and semiconductors, as reviewed in the literature [49, 50].”
• Microwave absorption properties of carbon nanocoils coated with highly controlled magnetic materials by atomic layer deposition. (2012, background): “The carbon nanocoils coated with magnetic materials by ALD can be fabricatedat large scales andare commercially feasible to be used as microwave absorbers since the production capacity can be greatly increased by applying batch reactors with large reactor volume.(8) Considering the vast library ofma”