Developments of Plasma Etching Technology for Fabricating Semiconductor Devices

By H. Abe, M. Yoneda, N. Fujiwara. 2008

250 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials

View Paper: https://www.semanticscholar.org/paper/27fe4f70f68a272e8e35695541cd9bace72a1411