Optical thin-film materials with low refractive index for broadband elimination of Fresnel reflection
By J. Xi, M. Schubert, Jong Kyu Kim, E. Fred Schubert, Minfeng Chen, Shawn-Yu Lin, W. Liu, J. Smart. 2007
1,155 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Surfaces, Coatings and Films
View Paper: https://www.semanticscholar.org/paper/275aa9aa6713c5f35721c08572a9729302c6d82a
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In Atomic and Molecular Physics, and Optics
- Loucas Tsakalakos
- José Sánchez-Dehesa
- A. González‐Elipe
- Á. Barranco
- A. Borrás
- D. Torrent
- Ronggui Yang
- Xin Qian
In Electrical and Electronic Engineering
- Loucas Tsakalakos
- A. González‐Elipe
- Á. Barranco
- Dongliang Zhao
- A. Borrás
- Lin Yao
- Ronggui Yang
- Xiaokun Gu
In Surfaces, Coatings and Films
Citations in the corpus
- Recent progress in antireflection and self-cleaning technology – From surface engineering to functional surfaces (2014, methodology): “3 by changing the vapor-deposition incident angle using the oblique-angle deposition method [69].”
- Strong broadband optical absorption in silicon nanowire films (2007, result): “the same wavelength range our samples typically show a constant total reflectance of ≤ 2% and a specular reflectance of < 1% (not shown), on par with recent data presented by Shubert and co-workers for graded index nanostructured films [21].”