Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

By J. Aarik, A. Aidla, H. Mändar, T. Uustare. 2001

207 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/265f2dba23371642462975a1e21802366c532612