Comparative study of SiOCH low-k films with varied porosity interacting with etching and cleaning plasma

By D. Shamiryan, M. Baklanov, S. Vanhaelemeersch, K. Maex. 2002

140 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/20c74e42fc97191a2c695156edcea3b507061eb2