A comparative study on reactive and non-reactive unbalanced magnetron sputter deposition of TiN coatings

By P. Mayrhofer, F. Kunc, J. Musil, C. Mitterer. 2002

204 citations recorded by the source corpus.

Subfields: Condensed Matter Physics, Materials Chemistry, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/2045454e3ad71aa554e15ceaced3835c90dff599

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Condensed Matter Physics

1. P. Patsalas
2. N. Kalfagiannis
3. S. Kassavetis

In Materials Chemistry

1. H. Clemens
2. P. Mayrhofer
3. C. Mitterer
4. L. Hultman
5. N. Kalfagiannis
6. S. Kassavetis
7. P. Patsalas
8. Yury Gogotsi

In Mechanics of Materials

1. P. Mayrhofer
2. H. Clemens
3. C. Mitterer
4. L. Hultman
5. N. Kalfagiannis
6. S. Kassavetis
7. P. Patsalas
8. J. Musil

Citations in the corpus

• Microstructural design of hard coatings (2006, methodology): “2, a crystallite size of 24 nm is estimated by XRD line broadening [15].”
• Optical Properties and Plasmonic Performance of Titanium Nitride (2015, methodology): “A wide variety of fabrication techniques have been used for the growth of B1-TiN films, such as Magnetron Sputtering (MS) [83–90], Cathodic Vacuum Arc (CVA) [91–93], Chemical Vapor Deposition (CVD) [94,95], Atomic Layer Deposition (ALD) [96,97], Pulsed Laser Deposition [15,16,98,99], Ion Beam Assist”