EUV Sources for Lithography

By V. Bakshi. 2006

225 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/1f37019fdbf59352ad9b072b6acd0c2eb2884999

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

1. J. Macfarlane
2. Igor E. Golovkin
3. P. Wang
4. P. Woodruff
5. N. Pereyra

Citations in the corpus

• SPECT3D - A Multi-Dimensional Collisional-Radiative Code for Generating Diagnostic Signatures Based on Hydrodynamics and PIC Simulation Output (2007, background): “Radiation-hydrodynamics (RH) and particle-in-cell (PIC) codes are commonly used to simulate the heating and evolution of plasmas in a wide variety of high energy density physics (HEDP) experiments, including laser-driven inertial fusion [1], z-pinch [2,3], short-pulse laser [4,5], and commercially-d”