Atomic layer deposition of palladium films on Al2O3 surfaces

By Jeffrey W. Elam, A. Zinovev, C. Y. Han, Hsien‐Hau Wang, U. Welp, J. Hryn, M. Pellin. 2006

159 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/1f08d0bd0f22fd1e3cde63768db5c29bf695a5fb

How researchers see this paper

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In Electrical and Electronic Engineering

1. Junling Lu

In Materials Chemistry

1. Weixin Huang
2. Junling Lu
3. Xusheng Zheng

Citations in the corpus

• Enhancing both selectivity and coking-resistance of a single-atom Pd1/C3N4 catalyst for acetylene hydrogenation (2017, background): “9%) and formalin (Aldrich, 37% HCHO and 15% CH3OH in aqueous solution) [35, 36].”