Comparison of TiO2 and other dielectric coatings for buried‐contact solar cells: a review

By B. Richards. 2004

191 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/1e043ff7bf0b790090e10a5af40e13e3e9a319f5

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Atomic and Molecular Physics, and Optics

1. A. Shalav
2. S. De Wolf
3. Martin A. Green
4. B. Richards

In Electrical and Electronic Engineering

1. A. Shalav
2. B. Richards
3. S. De Wolf
4. Martin A. Green
5. K. Weber
6. Xinbo Yang
7. Ewan D. Dunlop
8. Yoshihiro Hishikawa

Citations in the corpus

• Enhancing the Near-Infrared Spectral Response of Silicon Optoelectronic Devices via Up-Conversion (2007, background): “First, the front surface SiO2 antireflection (AR) coating could be replaced by a plasma-enhanced chemical vapor deposition silicon nitride (a−SiNx : H)/SiO2 stack as is used in high-efficiency solar cells [23].”
• Luminescent layers for enhanced silicon solar cell performance: Up-conversion (2006, background): “Of these materials, crystalline ZnSe is commonly used for the fabrication of high refractive index optics, while TiO2 has been commonly used as an AR coating [50].”
• Industrially feasible, dopant‐free, carrier‐selective contacts for high‐efficiency silicon solar cells (2017, background): “Due to the excellent optical and stability properties, TiO2 thin films have been commonly investigated as antireflection coating in the PV industry for screen-printed solar cells before PECVD-SiNx was developed [38].”