Conformal Coating on Ultrahigh-Aspect-Ratio Nanopores of Anodic Alumina by Atomic Layer Deposition

By Jeffrey W. Elam, D. Routkevitch, P. Mardilovich, S. George. 2003

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Novel Microsystem Applications with New Techniques in Low‐Temperature Co‐Fired Ceramics (2005, background): “Another possibility might be atomic layer deposition (ALD) of materials like aluminum oxide that can coat aspect ratios approaching 10(4) under some circumstances.(46) Filling with an SVM has preserved vias and ports under a variety of lamination techniques.”
Transport phenomena in nanofluidics (2008, unknown): “Elam et al., 2003; Chen, Mitsui, Farmer, et al., 2004".”
Nanoporous anodic aluminium oxide: Advances in surface engineering and emerging applications (2013, background): “Pioneering work on ALD modification of AAO demonstrated that ALD of silica, titania and alumina can be used to controllably reduce the pore dimensions of AAO, improving its catalytic, optical and transport properties [223–226].”
Thickness dependence of sensor response for CO gas sensing by tin oxide films grown using atomic layer deposition (2008, background): “ALD can deposit very conformally on particles [63] or high aspect ratio porous structures [ 64 ].”