Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors

By D. Hausmann, E. Kim, J. Becker, R. Gordon. 2002

485 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/178c7ac2b955ea6e47f4dfff4da5be452b326bb8