Fermi level depinning and contact resistivity reduction using a reduced titania interlayer in n-silicon metal-insulator-semiconductor ohmic contacts

By A. Agrawal, Joyce C. Lin, M. Barth, R. White, B. Zheng, S. Chopra, Shashank Gupta, Ke Wang, J. Gelatos, S. Mohney and 1 more. 2014

157 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/17294bd656c6f2bee350f9dbbbb370e64d7f326e