Thermal expansion coefficient of polycrystalline silicon and silicon dioxide thin films at high temperatures

By H. Tada, Amy E. Kumpel, R. Lathrop, John B. Slanina, P. Nieva, P. Zavracky, I. Miaoulis, P. Wong. 2000

237 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/1198ed7c416fd0542069cf7ef7778b67f40b9f1a