Synthesis of Doped, Ternary, and Quaternary Materials by Atomic Layer Deposition: A Review

By A. Mackus, Joel R. Schneider, Callisto MacIsaac, J. Baker, S. Bent. Chemistry of Materials, 2018

239 citations recorded by the source corpus.

In the past decade, atomic layer deposition (ALD) has become an important thin film deposition technique for applications in nanoelectronics, catalysis, and other areas due to its high conformality...

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/119642a240d5521ecbd5f6c3470b71b869f56ffe