Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography

By Zhaoning Yu, P. Deshpande, Wei Wu, J. Wang, Stephen Y. Chou. 2000

144 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Electrical and Electronic Engineering, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/1177148dfaf888dcdc80626f7ab110c1a7b284f4

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

1. S. H. Kim
2. Kidong Lee
3. Sarng-Hoon Lee
4. Joo-Do Park
5. Jin‐Sung Kim
6. Seh-Won Ahn
7. P. Yoon

Citations in the corpus

• Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography (2005, background): “Nanoimprint lithography (NIL) is an emerging technology enabling low-cost and high-throughput nanofabrication as small as 10 nm [4, 5].”