3D Micro‐ and Nanostructures via Interference Lithography
By Ji‐Hyun Jang, C. Ullal, M. Maldovan, T. Gorishnyy, S. Kooi, C. Koh, E. Thomas. 2007
219 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Biomedical Engineering
View Paper: https://www.semanticscholar.org/paper/0b35a3a677630badd1af12bb0a3949ff7d95562b
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In Atomic and Molecular Physics, and Optics
In Biomedical Engineering
Citations in the corpus
- 3D direct writing fabrication of electrodes for electrochemical storage devices (2017, methodology): “Currently, several strategies have been employed to accurately prepare 3D architectures including direct ink writing (DIW) [21], direct laser writing (DLW) [22], interference lithography (IL) [23], phase-mask lithography (PML) [24], and colloidal self-assembly (CSA) [25].”