Electron-Beam Lithography for Patterning Biomolecules at the Micron and Nanometer Scale

By C. Kolodziej, H. Maynard. 2012

136 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/0ac45f5171ed716b817fe2c5970c9782ffcfbf3f

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In Biomedical Engineering

1. Bruce K. Gale

In Electrical and Electronic Engineering

1. Bruce K. Gale

Citations in the corpus

• Recent advance in surface modification for regulating cell adhesion and behaviors (2020, background): “EBL is a maskless lithography technology that scans a beam of electrons through a surface covered by a resist film sensitive to these electrons, thus depositing energy on the resist film in the desired manner [80].”
• A Review of Current Methods in Microfluidic Device Fabrication and Future Commercialization Prospects (2018, methodology): “However, the rastering process of EBL makes it a fairly low throughput process [88].”