Recombination behavior and contact resistance of n+ and p+ poly-crystalline Si/mono-crystalline Si junctions
By U. Römer, Robby Peibst, T. Ohrdes, B. Lim, J. Krügener, E. Bugiel, T. Wietler, R. Brendel. 2014
226 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/07a13e00676cf2bbf1b8d216027265df2b01004a
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In Atomic and Molecular Physics, and Optics
In Electrical and Electronic Engineering
In Materials Chemistry
Citations in the corpus
- Ion Implantation for Poly-Si Passivated Back-Junction Back-Contacted Solar Cells (2015, methodology): “, [13]) requires further discussion, while”
- Passivating Contacts for Crystalline Silicon Solar Cells: From Concepts and Materials to Prospects (2018, background): “6 nm [64], it should be noted that tunneling becomes less likely in the case of thicker oxides, since”
- Contact Selectivity and Efficiency in Crystalline Silicon Photovoltaics (2016, unknown): “The process is similar to that reported in [17].”